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World premieres set for Formnext 2021

Batch processes with standard wafers

Nanoscribe plans to attend Formnext with the new Quantum X shape – an ultra-precise 3D printer for rapid prototyping and wafer-scale batch processing in research and industry.

Based on two-photon polymerization (2PP), this laser lithography system combines proprietary printing technologies that make it the optimal tool for the microfabrication of virtually any 2.5D or 3D shape with submicron precision on areas up to 25 square centimeters.

The new Quantum X shape. Picture: Nanoscribe
The new Quantum X shape. Picture: Nanoscribe

An upright system with an automatic photoresin-dispensing function, the Quantum X shape is suitable for industrial batch processes with standard wafers up to six inches in size. According to Nanoscribe, this expands the 3D microfabrication opportunities in multiple research fields and industries, such as life sciences, material engineering, microfluidics, micro-optics, micromechanics, and microelectromechanical systems (MEMS).

The Quantum X shape’s output is the result of a galvo system and electronics system control units on a granite-based platform, which is combined with an industrial-grade femtosecond pulsed laser. The system features laser focus trajectory control that accelerates and decelerates the galvo mirror units to the optimum scanning speed and dynamically adjusts the laser power at 1 MHz modulation rates.


Nanoscribe at Formnext 2021:

Hall 12.1, booth G61


  • Additive Manufacturing